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Effects of design parameters on performance and cost analysis of combined ultraviolet-biofilter systems

Can WANG, Jinying XI, Hongying HU, Insun KANG

《环境科学与工程前沿（英文）》 2012年 第6卷 第4期   页码 588-594 doi: 10.1007/s11783-012-0433-8

摘要： A conceptual mathematical model was used to evaluate the design parameters of a combined ultraviolet (UV)-biofilter system, and perform a cost analysis. Results showed that the UV light source strength and the gas residence times in the UV system (UVRT) and biofilter (EBRT) had positive effects on the overall chlorobenzene removal efficiency of the system. High ratio of UVRT to EBRT improved the removal efficiency, suggesting that the UV system has a greater effect on the overall performance of the system compared with the biofilter. Analysis of the capital and operating costs showed that the capital costs of the standalone biofilter system were much higher than those of the standalone UV system. However, the biofilter operating costs were lower than those of the UV system. The operating costs of the combined UV-biofilter system increased with increasing UVRT/EBRT ratio, whereas its capital costs decreased.

关键词： volatile organic compounds     ultraviolet (UV) photodegradation     biofilter     modeling     cost analysis    

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Ultraviolet exposure enhanced silicon direct bonding

Guanglan LIAO, Xuekun ZHANG, Xiaohui LIN, Canghai MA, Lei NIE, Tielin SHI,

《机械工程前沿（英文）》 2010年 第5卷 第1期   页码 87-92 doi: 10.1007/s11465-009-0078-x

摘要： Ultraviolet (UV) exposure, as an additional technique following the traditional wet chemical activation processes, is applied to enhance hydrophilic silicon direct bonding. The effects of UV exposure on silicon wafers’ nano-topography and bonding strength are studied. It is found that the surface roughness of silicon wafers initially decreases and then increases with UV exposure time, and the bonding strength increases and then decreases accordingly. The correlations of annealing temperature and annealing time vs. bonding strength are experimentally explored. Results indicate that the bonding strength increases sharply then gently with increasing annealing temperature and annealing time using UV exposure. Besides, the reliability of silicon direct bonding with UV exposure enhancement after the high/low temperature cycle test, constant temperature and humidity test, vibration test and shock test is investigated. It follows from the results that the bonding strength of silicon wafer pairs with UV exposure decreases after the environmental tests, whereas the residual strength is still higher than that without UV exposure, and the variation trends of bonding strength vs. UV exposure time, annealing temperature and annealing time remain unchanged. Therefore, following the traditional wet chemical activation processes, appropriate UV exposure (about three minutes in this study) is effective and promising to enhance silicon direct bonding.

关键词： ultraviolet (UV) exposure     silicon direct bonding     bonding strength     reliability    

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Effects of humic acid fractions with different polarities on photodegradation of 2,4-D in aqueous environments

YU Chunyan, QUAN Xie, OU Xiaoxia, CHEN Shuo

《环境科学与工程前沿（英文）》 2008年 第2卷 第3期   页码 291-296 doi: 10.1007/s11783-008-0049-1

摘要： Four fractions (A, B, C, and D) of humic acids (HAs) were separated based on the polarity from weak to strong. UV-vis absorption and Fourier transform infrared spectroscopy (FTIR) analysis show that the fractions C and D possessed more aromatic C=C content. The influences of HAs and their fractions on the photolysis were investigated by the photodegradation of 2,4-D solutions under simulated solar light irradiation. The degradation rate of 2,4-D was found to decrease in the presence of bulk HAs or their fractions especially at high HAs concentration. The fractions of strong polarity C and D retarded the degradation rate more than the fractions of weak polarity A and B. This could be attributed to the different absorption intensity of the four HAs fractions in the order of D ≥ C > A > B, and the stronger ?-? electron donor-acceptor interactions between the strong polar fractions and 2,4-D.

关键词： polarity     photodegradation     different absorption     UV-vis absorption     FTIR    

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Photolysis and photooxidation of typical gaseous VOCs by UV Irradiation: Removal performance and mechanisms

In-Sun Kang, Jinying Xi, Hong-Ying Hu

《环境科学与工程前沿（英文）》 2018年 第12卷 第3期 doi: 10.1007/s11783-018-1032-0

摘要： Photodegradation by ultraviolet irradiation (UV) is increasingly applied in volatile organic compound (VOC) and odor gas treatments. In this study, 27 typical VOCs, including 11 hydrocarbons and 16 hydrocarbon derivatives, at 150–200 ppm in air and nitrogen gas were treated by a laboratory-scale UV reactor with 185/254 nm irradiation to systematically investigate their removal and conversion by UV irradiation. For the tested 27 VOCs, the VOC removal efficiencies in air were within the range of 13%–97% (with an average of 80%) at a retention time of 53 s, which showed a moderate positive correlation with the molecular weight of the VOCs ( = 0.53). The respective contributions of photolysis and photooxidation to VOC removal were identified for each VOC. According to the CO results, the mineralization rate of the tested VOCs was within the range of 9%–90%, with an average of 41% and were negatively correlated to the molecular weight ( = 0.63). Many of the tested VOCs exhibited high concentration particulate matters in the off-gases with a 3–283 mg/m PM range and a 2–40 mg/m PM range. The carbon balance of each VOC during UV irradiation was analyzed based on the VOC, CO and PM concentrations. Certain organic intermediates and 23–218 ppm ozone were also identified in the off-gases. Although the UV technique exhibited a high VOC removal efficiency, its drawbacks, specifically low mineralization, particulate matters production, and ozone emission, must be considered prior to its application in VOC gas treatments.

关键词： VOCs     UV photodegradation     Particulate matters     Ozone    

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Factors influencing the photodegradation of

Bingbing XU, Zhonglin CHEN, Fei QI, Jimin SHEN, Fengchang WU

《环境科学与工程前沿（英文）》 2009年 第3卷 第1期   页码 91-97 doi: 10.1007/S11783-009-0013-8

摘要： In order to provide basic data for practical application,photodegradation experiment of -nitrosodimethylamine (NDMA) in aqueous solution was carried out with a low-pressure Hg lamp. Effects of the initial concentration of NDMA, solution pH, dissolved oxygen, and the presence of humic acid on NDMA photodegradation were investigated. NDMA at various initial concentrations selected in this study was almost completely photodegraded by UV irradiation within 20 min, except that at 1.07 mmol/L, NDMA could be photodegraded almost completely in the acidic and neutral solutions, while the removal efficiency decreased remarkably in the alkaline solution. Dissolved oxygen enhanced the NDMA photodegradation, and the presence of humic acid inhibited the degradation of NDMA. Depending on the initial concentration of NDMA, NDMA photodegradation by UV obeyed the pseudo-first-order kinetics. Dimethylamine, nitrite, and nitrate were detected as the photodegradation products of NDMA. O was found to be the reactive oxygen species present in the NDMA photodegradation process by UV, based on the inhibiting experiments using tert-butanol and sodium azide.

关键词： N-nitrosodimethylamine (NDMA)     ultraviolet irradiation     degradation kinetic     dimethylamine     photodegradation product    

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Patterned wafer bonding using ultraviolet adhesive

Rui ZHUO, Guanglan LIAO, Wenliang LIU, Lei NIE, Tielin SHI

《机械工程前沿（英文）》 2011年 第6卷 第2期   页码 214-218 doi: 10.1007/s11465-011-0130-5

摘要：

The process of patterned wafer bonding using ultraviolet (UV) adhesive as the intermediate layer was studied. By presetting the UV adhesive guide-layer, controlling the thickness of the intermediate layer (1– 1.5 μm), appropriate pre-drying temperature (60°C), and predrying time (6 min), we obtained the intermediate layer bonding of patterned quartz/quartz. Experimental results indicate that patterned wafer bonding using UV adhesive is achieved under room temperature. The process also has advantages of easy operation, low cost, and no plugging or leakage in the patterned area after bonding. Using the process, a microfluidic chip for red blood cell counting was designed and fabricated. Patterned wafer bonding using UV adhesive will have great potential in the fabrication of microfluidic chips.

关键词： ultraviolet (UV) adhesive     intermediate layer     patterned wafer bonding    

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Decomposition of aqueous chlorinated contaminants by UV irradiation with H

Eunsung KAN,Chang-Il KOH,Kyunghyuk LEE,Joonwun KANG

《环境科学与工程前沿（英文）》 2015年 第9卷 第3期   页码 429-435 doi: 10.1007/s11783-014-0677-6

摘要： In the present study, the decomposition rates of carbon tetrachloride (CCl ) and 2,4-dichlorophenol (2,4-DCP) in water by the ultraviolet (UV) light irradiation alone and H O /UV were experimentally investigated. The detailed experimental studies have been conducted for examining treatment capacities of the two different ultraviolet light sources (low and medium pressure Hg arc) in H O /UV processes. The low or medium UV lamp alone resulted in a 60%–90% decomposition of 2,4-DCP while a slight addition of H O resulted in a drastic enhancement of the 2,4-DCP decomposition rate. The decomposition rate of 2,4-DCP with the medium pressure UV lamp alone was about 3–6 times greater than the low pressure UV lamp alone. In the direct photolysis of aqueous CCl , the medium pressure UV lamp had advantage over the low pressure UV lamp because the molar extinction coefficient of CCl at shorter wavelength (210–220 nm) is about 20 to 50 times higher than that at 254 nm. However, adding H O to the medium pressure UV lamp system rendered a negative oxidation rate because H O acted as a UV absorber being competitive with CCl due to negligible reaction between CCl and OH radicals. The results from the present study indicated significant influence of the photochemical properties of the target contaminants on the photochemical treatment characteristics for designing cost-effective UV-based degradation of toxic contaminants.

关键词： H2O2/ultraviolet (UV) light     advanced oxidation     UV light irradiation     chlorinated contaminants     photochemical treatment characteristics    

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Photodegradation of chromophoric dissolved organic matters in the water of Lake Dianchi, China

Yuan ZHANG,Chunming HU,Tao YU

《环境科学与工程前沿（英文）》 2015年 第9卷 第4期   页码 575-582 doi: 10.1007/s11783-014-0664-y

摘要： Water samples were taken from Lake Dianchi, on the Yungui Plateau of southwest China, and experiments were conducted to simulate the photochemical degradation characteristic of chromophoric dissolved organic matter (CDOM) in the lake water. Three groups of experiments under different light conditions: ultraviolet (UV) light, visible light, and dark, were done and variations of fluorescence properties, UV absorbance, and dissolved organic carbon (DOC) concentrations during the experiments were analyzed to study the photodegradation process of CDOM with time. The result showed that light irradiation led to significant photochemical degradation of CDOM, resulting in changes in florescent properties, absorbance losses, decreases in aromaticity and average molecular weight, as well as decline in DOC concentration in the water. It was also observed that UV irradiation had greater effect than visible light did. However, various fluorophores had different sensitivities to the same irradiation condition, that is, protein-like fluorophore at the low excitation wavelengths is more sensitive to UV irradiation than the other fluorophores, and is more readily to undergo photo-degradation. In addition, visible light irradiation did not have significant impact on DOC in the water, with DOC concentration decrease by 5.57% –59.9% during the experiment time. These results may provide new knowledge on the environment behavior of CDOM in the water of Lake Dianchi.

关键词： chromophoric dissolved organic matter     photodegradation     ultraviolet radiation     dissolved organic carbon    

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Bacterial inactivation, DNA damage, and faster ATP degradation induced by ultraviolet disinfection

Chao Yang, Wenjun Sun, Xiuwei Ao

《环境科学与工程前沿（英文）》 2020年 第14卷 第1期 doi: 10.1007/s11783-019-1192-6

摘要： • Long amplicon is more effective to test DNA damage induced by UV. • ATP in bacteria does not degrade instantly but does eventually after UV exposure. • After medium pressure UV exposure, ATP degraded faster. The efficacy of ultraviolet (UV) disinfection has been validated in numerous studies by using culture-based methods. However, the discovery of viable but non-culturable bacteria has necessitated the investigation of UV disinfection based on bacterial viability parameters. We used quantitative polymerase chain reaction (qPCR) to investigate DNA damage and evaluated adenosine triphosphate (ATP) to indicate bacterial viability. The results of qPCR effectively showed the DNA damage induced by UV when using longer gene amplicons, in that sufficiently long amplicons of both 16S and gadA indicated that the UV induced DNA damages. The copy concentrations of the long amplicons of 16S and gadA decreased by 2.38 log/mL and 1.88 log/mL, respectively, after exposure to 40 mJ/cm2 low-pressure UV. After UV exposure, the ATP level in the bacteria did not decrease instantly. Instead it decreased gradually at a rate that was positively related to the UV fluence. For low-pressure UV, this rate of decrease was slow, but for medium pressure UV, this rate of decrease was relatively high when the UV fluence reached 40 mJ/cm2. At the same UV fluence, the ATP level in the bacteria decreased at a faster rate after exposure to medium-pressure UV.

关键词： UV disinfection     DNA damage     qPCR     ATP    

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Effect of the ultraviolet/chlorine process on microbial community structure, typical pathogens, and antibiotic

《环境科学与工程前沿（英文）》 2022年 第16卷 第8期 doi: 10.1007/s11783-022-1521-z

摘要：

• UV/chlorine can effectively remove VBNC pathogens, ARGs and MGEs in reclaimed water.

关键词： UV/chlorine process     Pathogen     Antibiotic resistance genes     High-throughput qPCR     Reclaimed water    

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Using mRNA to investigate the effect of low-pressure ultraviolet disinfection on the viability of

Chao Yang, Wenjun Sun, Xiuwei Ao

《环境科学与工程前沿（英文）》 2019年 第13卷 第2期 doi: 10.1007/s11783-019-1111-x

摘要：

UV can induce damages on mRNA consistently among different genes.

SOS response was more active after UV treatment.

Programmed cell death was not found to be more active after UV treatment.

关键词： UV disinfection     Viability     mRNA     SOS response     Programmed cell death    

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Impacts of advanced treatment processes on elimination of antibiotic resistance genes in a municipal wastewater treatment plant

Lian Yang, Qinxue Wen, Zhiqiang Chen, Ran Duan, Pan Yang

《环境科学与工程前沿（英文）》 2019年 第13卷 第3期 doi: 10.1007/s11783-019-1116-5

摘要：

The distributions of ARGs were monitored in a WWTP in Harbin during six months.

CASS had the best removal efficacy of ARGs compared to other processes in the WWTP.

UV disinfection could effectively control the HGT.

AGAC significantly remove ARGs and organics due to its high absorption capacity.

Combination of ozone and AGAC significantly improve removal of ARGs and organics.

关键词： Antibiotic resistance genes (ARGs)     Wastewater treatment plant (WWTP)     Ultraviolet (UV)     Ozonation     Granular activated carbon (GAC)    

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Removal of virus aerosols by the combination of filtration and UV-C irradiation

《环境科学与工程前沿（英文）》 2023年 第17卷 第3期 doi: 10.1007/s11783-023-1627-y

摘要：

● The removal of virus aerosols by filtration and UV-C irradiation was proposed.

关键词： Filtration system     UV-C irradiation     Virus aerosol     Public health     COVID-19    

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Effect of natural aquatic humic substances on the photodegradation of bisphenol A

ZHAN Manjun, YANG Xi, KONG Lingren, YANG Hongshen

《环境科学与工程前沿（英文）》 2007年 第1卷 第3期   页码 311-315 doi: 10.1007/s11783-007-0052-y

摘要： The photochemical degradation of bisphenol A (BPA) was studied in the presence of natural humic sub stances from different origins under simulated solar irradiation. BPA underwent insignificant direct photolysis in neutral water, but rapid photosensitized degradation in four humic substances solutions via pseudo-first-order reaction occurred. The photodegradation rate of BPA was insensitive to the different initial BPA concentrations and was inhibited in aerated solution compared with the deoxygenated medium. The reactive oxygen species (ROS) such as ?·OH and O produced from excitation of humic substances under irradiation was determined from the quenching kinetic experiment using molecular probe. The five main intermediate photoproducts of BPA in Nordic lake fulvic acid (NOFA) were tentatively identified using gas chromatography/mass spectrometer (GC/MS). Based on the identification of ROS and the analysis of photoproduct formation, the possible phototransformation pathways of BPA were proposed, involving the direct photolysis due to the energy transfer from the triplet state humic substance (HS) to BPA molecules and hydroxyl radical addition and oxidation as well.

关键词： irradiation     photoproduct     deoxygenated     possible phototransformation     bisphenol    

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and bacteriophage MS2 disinfection by UV, ozone and the combined UV and ozone processes

Jingyun FANG,Huiling LIU,Chii SHANG,Minzhen ZENG,Mengling NI,Wei LIU

《环境科学与工程前沿（英文）》 2014年 第8卷 第4期   页码 547-552 doi: 10.1007/s11783-013-0620-2

摘要： The combination of low-dose ozone with ultraviolet (UV) irradiation should be an option to give benefit to disinfection and reduce drawbacks of UV and ozone disinfection. However, less is known about the disinfection performance of UV and ozone (UV/ozone) coexposure and sequential UV-followed-by-ozone (UV-ozone) and ozone-followed-by-UV (ozone-UV) exposures. In this study, inactivation of and bacteriophage MS2 by UV, ozone, UV/ozone coexposure, and sequential UV-ozone and ozone-UV exposures was investigated and compared. Synergistic effects of 0.5–0.9 log kill on inactivation, including increases in the rate and efficiency, were observed after the UV/ozone coexposure at ozone concentrations as low as 0.05 mg·L in ultrapure water. The coexposure with 0.02-mg·L ozone did not enhance the inactivation but repressed photoreactivation. Little enhancement on inactivation was found after the sequential UV-ozone or ozone-UV exposures. The synergistic effect on MS2 inactivation was less significant after the UV/ozone coexposure, and more significant after the sequential ozone-UV and UV-ozone exposures, which was 0.2 log kill for the former and 0.8 log kill for the latter two processes, at ozone dose of 0.1 mg·L and UV dose of 8.55 mJ·cm in ultrapure water. The synergistic effects on disinfection were also observed in tap water. These results show that the combination of UV and low-dose ozone is a promising technology for securing microbiological quality of water.

关键词： bacteria inactivation     photoreactivation     water disinfection     UV     ozone    

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标题 作者 时间 类型 操作

Effects of design parameters on performance and cost analysis of combined ultraviolet-biofilter systems

Can WANG, Jinying XI, Hongying HU, Insun KANG

期刊论文

Ultraviolet exposure enhanced silicon direct bonding

Guanglan LIAO, Xuekun ZHANG, Xiaohui LIN, Canghai MA, Lei NIE, Tielin SHI,

期刊论文

Effects of humic acid fractions with different polarities on photodegradation of 2,4-D in aqueous environments

YU Chunyan, QUAN Xie, OU Xiaoxia, CHEN Shuo

期刊论文

Photolysis and photooxidation of typical gaseous VOCs by UV Irradiation: Removal performance and mechanisms

In-Sun Kang, Jinying Xi, Hong-Ying Hu

期刊论文

Factors influencing the photodegradation of

Bingbing XU, Zhonglin CHEN, Fei QI, Jimin SHEN, Fengchang WU

期刊论文

Patterned wafer bonding using ultraviolet adhesive

Rui ZHUO, Guanglan LIAO, Wenliang LIU, Lei NIE, Tielin SHI

期刊论文

Decomposition of aqueous chlorinated contaminants by UV irradiation with H

Eunsung KAN,Chang-Il KOH,Kyunghyuk LEE,Joonwun KANG

期刊论文

Photodegradation of chromophoric dissolved organic matters in the water of Lake Dianchi, China

Yuan ZHANG,Chunming HU,Tao YU

期刊论文

Bacterial inactivation, DNA damage, and faster ATP degradation induced by ultraviolet disinfection

Chao Yang, Wenjun Sun, Xiuwei Ao

期刊论文

Effect of the ultraviolet/chlorine process on microbial community structure, typical pathogens, and antibiotic

期刊论文

Using mRNA to investigate the effect of low-pressure ultraviolet disinfection on the viability of

Chao Yang, Wenjun Sun, Xiuwei Ao

期刊论文

Impacts of advanced treatment processes on elimination of antibiotic resistance genes in a municipal wastewater treatment plant

Lian Yang, Qinxue Wen, Zhiqiang Chen, Ran Duan, Pan Yang

期刊论文

Removal of virus aerosols by the combination of filtration and UV-C irradiation

期刊论文

Effect of natural aquatic humic substances on the photodegradation of bisphenol A

ZHAN Manjun, YANG Xi, KONG Lingren, YANG Hongshen

期刊论文

and bacteriophage MS2 disinfection by UV, ozone and the combined UV and ozone processes

Jingyun FANG,Huiling LIU,Chii SHANG,Minzhen ZENG,Mengling NI,Wei LIU

期刊论文